Intel Foundry has reached a significant milestone in chip manufacturing, completing the assembly of the primo scanner litografico High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) commercially at its research and development site in Hillsboro, Oregon. This is one of Intel's investments to maintain leadership in chip manufacturing after the node Intel 18A.
Intel is the first company in the industry to adopt High NA EUV
It tool TWINSCAN EXE:5000 High NA EUV, supplied by ASML, is going through the calibration phases and will soon be ready for production. This new tool significantly improves resolution and scaling capabilities for next-generation processors. All thanks to an innovative optics design.
Adopting High NA EUV will allow Intel Foundry to print components up to 1.7 times smaller compared to existing EUV tools, with up to 2.9 times greater density. Intel plans to use both 0.33NA EUV and 0.55NA EUV along with other lithographic processes in the development and manufacturing of advanced chips, starting with proof point on Intel 18A in 2025 and continuing with Intel 14A production.
The collaboration between Intel and ASML led to the development of the TWINSCAN EXE:5000. The company then transported the instrument to Oregon in more than 250 crates inside 43 shipping containers, weighing more than 150 tons in total.
High NA EUV represents an evolutionary step beyond EUV lithography, using a wavelength of light of 13.5 nm which is not found naturally on Earth. A powerful laser hits a drop of tin heated to almost 220,000 degrees Celsius, then reflects off a mask containing the desired circuit model and passes through an optical system built with extremely high-precision mirrors.
This type of technology allows Intel to build increasingly advanced chips. Find further information here.
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